Products » Multi-Axis Systems » EZ-GS0760 Dynamic Wafer Stage
Dynamic Wafer Stage
EZ-GS0760 | Key Features
- X/Y Stage with Focus Axis (Z)
- Impulse Decoupled X- & Y-Axis
- High-Precision Positioning < ± 100 nm
- Position Stability < ± 5 nm
- Repeatability < ± 40 nm @ 3 σ
- Y-Axis Acceleration up to 8 g
- Integrated XY SIOS Differential Laser Interferometer
- Quick-swap Lift-Pin Mechanism
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Product description
The EZ-GS0760 wafer stage has been developed for high-dynamic processes, such as laser fuse cutting. It offers excellent repeatability, optimal accuracy, and exceptional dynamic performance.
Built-in features:
- Mechanical impulse decoupling in both the X- and Y-axes for enhanced dynamic and positional stability.
- The unique design with a common reaction mass for both axes keeps reaction forces independent of the measuring frame and minimizes mass.
- A high-resolution SIOS differential laser interferometer ensures virtually Abbe-error-free performance, minimizing measurement errors at the point of interest, even at maximum dynamics.
- Outstanding Y-axis acceleration up to 8 g; water cooling allows travel profiles with up to 2 g continuous acceleration.
- The Y-axis natural frequency, including wafer chuck, exceeds 500 Hz.
- The compact height of just 87 mm provides a low center of gravity and enables high dynamics.
- Large top plate (granite) to accommodate customer applications.
Applications: Fuse cutting, high-precision positioning, scanning, and on-the-fly laser processes
Specifications
Type | Unit | Value |
---|---|---|
Positioning Range X/Y | ||
Stroke Z | ||
Max. Payload X/Y (for dynamic applications) | ||
Max. Payload Z (for dynamic applications) | ||
Accuracy X/Y (3σ) | ||
Accuracy Z | ||
Repeatability X/Y (3σ, bidirectional) | ||
Repeatability Z (bidirectional) | ||
Horizontal Straightness X/Y | ||
Vertical Straightness X/Y | ||
Pitch X/Y | ||
Roll, Yaw X/Y | ||
Pitch, Yaw Z | ||
Max. Speed (X/Y) with 10 kg payload | ||
Max. Acceleration unloaded (X/Y) | ||
Mechanical Data | ||
Both Axes (X/Y) | ||
Dimension (w x l x h) | ||
Reaction Mass | ||
Total Mass | ||
Encoder | ||
Type | ||
Signal | ||
Interferometer | ||
Type | ||
Resolution | ||
Wave Length / Class | ||
Drive | ||
Type X/Y (2 drives for X-axis) | ||
Intermediate Circuit Voltage | ||
Constant Force X / Y | ||
Peak Force X / Y | ||
Interfaces and Environment | ||
Supply Pressure | ||
Vacuum Pressure | ||
Air Consumption | ||
Vacuum Consumption | ||
Limit Switch | ||
Media at workpiece level | ||
Clean Room Suitability | ||
Drive Control | ||
High end |
1) vermessen mit ACS Verstärker
2) alternativ absoluter Encoder möglich
3) ohne Faltenbalg, abhängig von Detailausführung